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CAS No:5824-40-8
MF:C19H17N
Appearance:white or off-white crystalline powder
Specification:98.5%
UN number:-
Package:1/5/10/25kgs/drum
Supply Capacity:Tons
Synonyms:Benzenemethanamine, alpha,alpha-diphenyl-;Methylamine, 1,1,1-triphenyl-;Triphenylmethanamine;TRIPHENYLMETHYLAMINE;TRIPHENYLAMINOMETHANE;TRITYLAMINE;TRT-NH2;TRT-AMINE,Tritylamine,"Tritylamine; Triphenylmethanamine; 5824-40-8; Triphenylmethylamine; NSC-1154; UR7TF3NW3P; DTXSID30206972; DTXCID60129463; 628-686-2; MFCD00008047; Benzenemethanamine, .alpha.,.alpha.-diphenyl-; 1,1,1-triphenylmethanamine; tritylamin; trityl amine; NSC1154; a,a-Diphenylbenzenemethanamine; Tritylamine; Aminotriphenylmethane; NSC 1154; Triphenylmethanamine;; NSC 1154; Triphenylaminomethane; triphenyl methylamine; Triphenylmethanamine #; Triphenylmethylamine, 99%; Methylamine,1,1-triphenyl-; SCHEMBL115149; CHEMBL272255; SCHEMBL1386074; SCHEMBL6450582; BDBM23786; Methylamine, 1,1,1-triphenyl-; ALBB-024943; Benzenemethanamine,.alpha.-diphenyl-; SBB007795; AKOS015962050; AC-7187; CS-W012522; Triphenylmethyl-containing compound, 15; AS-13269; BP-21026; FT106313; ST080691; SY004745; T0517; EN300-74715; C93492; Z1171161539; InChI=1/C19H17N/c20-19(16-10-4-1-5-11-16,17-12-6-2-7-13-17)18-14-8-3-9-15-18/h1-15H,20H",259.300,C19H17N,
Product application:Tritylamine,Triphenylmethylamine,5824-40-8,CAS 5824-40-8,Triphenylmethanamine,Organic synthesis intermediates,Pharmaceutical intermediates,Dye intermediates,Photosensitive materials,White powder,High purity Tritylamine,Tritylamine in stock,Industrial grade Tritylamine,Tritylamine applications,Protecting group reagent,Deprotection reaction,Fine chemicals,Tritylamine manufacturers,Tritylamine price,Amino protection,Trityl amine chemicals.
Tritylamine serves as a versatile organic synthesis intermediate, primarily utilized for the protection of amino groups in pharmaceutical chemistry to prevent side reactions during complex synthesis. It is also an essential building block in the dye industry and plays a significant role in photosensitive materials and photolithography within the electronics sector, enhancing the sensitivity and stability of high-performance components.