1-Ethylcyclopentyl methacrylate; EtCPMA

Product Details

CAS No:266308-58-1

MF:C11H18O2

Appearance:colorless or light-yellow transparent liquid

Specification:98.5%

UN number:-

Package:1/5/10/25kgs/drum

Supply Capacity:Tons

Synonyms:1-ethylcyclopentyl ester;(1-ethylcyclopentyl) 2-methylprop-2-enoate;Methacrylic Acid 1-Ethylcyclopentyl Ester;EtCPMA 1-Ethylcyclopentyl methacrylate ArF monomers;1-Ethylcyclopentyl methacrylate 266308-58-1;1-ethylcyclopentyl ester 266308-58-1;2-Propenoic acid, 2-methyl-, 1-ethylcyclopentyl ester;1-Ethylcyclopentyl Methacrylate (stabilized with MEHQ),1-Ethylcyclopentyl methacrylate,"1-Ethylcyclopentyl methacrylate; 266308-58-1; 2-Propenoic acid, 2-methyl-, 1-ethylcyclopentyl ester; (1-ethylcyclopentyl) 2-methylprop-2-enoate; 1-ethylcyclopentyl ester; MFCD23703079; 1-ethylcyclopentylmethacrylate; 1-ETHYLCYCLOPENTYL 2-METHYLPROP-2-ENOATE; 1-Ethylcyclopentyl Methacrylate (stabilized with MEHQ); SCHEMBL47303; DTXSID00592379; AKOS016011199; AS-69321; SY237970; DB-216110; E1388; D90621; 2-Propenoic acid, 2-methyl-, 1-ethylcyclopentyl ester (9CI, ACI)",182.260,C11H18O2,

Product application:1-Ethylcyclopentyl methacrylate, ECPMA, CAS 266308-58-1, Photoresist monomer, ArF photoresist chemicals, 193nm photoresist monomer, Alicyclic methacrylate, Semiconductor chemicals, Electronic grade ECPMA, Methacrylic acid 1-ethylcyclopentyl ester, High purity photoresist monomers, Monomer for ArF dry/immersion lithography, 2-Propenoic acid 2-methyl-1-ethylcyclopentyl ester, Polymerization monomer for photoresist.

 

1-Ethylcyclopentyl methacrylate (ECPMA) is a critical deep ultraviolet (DUV) photoresist monomer, primarily utilized in the synthesis of resin polymers for 193nm (ArF) lithography. Due to its unique 1-ethylcyclopentyl ester group, it offers excellent acid-sensitive deprotection properties during the photolithography process, significantly enhancing resolution and contrast. It also provides high plasma etch resistance and thermal stability to the resulting polymers, making it an essential electronic chemical for advanced semiconductor integrated circuit manufacturing.